Publikation

  • K. T. Kallis, V. V. Vendt, C. Küchenmeister, H. L. Fiedler
    „Preparation of nanoscale thermal time of flight sensors by e-beam lithography”,
    In: Microelectronic Engineering, Volume 97 (Sept. 2012,) S. 357-360
  • C. M. Zimmer, M. Kieschnick, K. T. Kallis, J. Schubert, U. Kunze and T.Doll
    „Nano photoelectron ioniser chip using LaB6 for ambient pressure trace gas detection”,
    In: Microelectronic Engineering, Volume 98 (Oct. 2012), S. 472-476
  • U. Künzelmann, M. R. Müller, K. T. Kallis, F. Schütte, S. Menzel, S. Engels, J. Fong, C. Lin, J. Dysard, J.W. Bartha and J. Knoch
    „Chemical-Mechanical Planarization of Aluminium Damascene Structures“,
    Int. Conference on Planarization/CMP Technology (ICPT 2012), Proceedings, pp. 371-376
  • F. Hoffmann, A. Loechte, G. Rebel, C. Krimphove, P. Glösekötter:
    Degradation aware energy storage using hybrid capacitors, published at 2nd IEEE
    ENERGYCON Conference & Exhibition, 2012, pp 60, ISBN 978-1-4673-1452-7,
    September 9-12 2012, Florence, Italy
  • C. Krimphove, F. Hoffmann, G. Rebel, P. Glösekötter:
    Wearout-Free Oxygen Sensor, published and awarded with the Bronze Leaf Certificate at the 8th Conference on Ph.D. Research in Microelectronics & Electronics, pp 339, ISBN 978-3-8007-3442-9, 12 – 15 Juni 2012, Aachen, Germany
  • K. T. Kallis, J. T. Horstmann and H. L. Fiedler, „Parameter fluctuations in multiple patterned deca-nm scaled CMOS structures“, In: Journal of Nano Research , Vol. 17 (Feb.2012), S. 157-163
  • C. Kontis, C. Küchenmeister, M. Müller, K. Kallis and J. Knoch, „Optimizing the identification of mono- and bilayer graphene on multilayer substrates“, In: Applied Optics, Vol. 51, Issue 3 (Jan. 2012), S. 385-389
  • K. T. Kallis, J. T. Horstmann, C. Küchenmeister, L. O. Keller and H. L. Fiedler
    „Enhanced lithography independent MOSFET-fabrication on bulk silicon with sub-50 nm-dimensions“, Transactions on Systems, Signals & Devices, Issues on Sensors, Circuits & Instrumentation Systems, Vol. 5, No. 4 (Dec. 2011)
  • K. T. Kallis, L. O. Keller, C. Küchenmeister, J. T. Horstmann, J. Knoch and H. L. Fiedler, „Nanofin based filaments for sensor applications“, Proceedings of the 36th International Conference on Micro- and Nano-Engineering (MNE), In: Microelectronic Engineering, Volume 88, Issue 8 (August 2011), Pages 2290-2293
  • J. T. Horstmann, K. T. Kallis and H. L. Fiedler
    „Reliability and Electrical Parameter Fluctuations of sub-50nm MOS-Transistors“
    In: Micromaterials and Nanomaterials 12 (2010), pp. 32-38, ISSN 1619-2486
  • R. R. Poloczek, K. T. Kallis, L. O. Keller and H. L. Fiedler
    „A new cost-effective Method of Planarisation for Multiple Metal Layers in the Sub-100 nm-Region“ In: Journal of Nanoscience and Nanotechnology, Volume 10, Number 9 (2010), S. 6046-6048
  • A. Olivares, J.M. Górriz, G. Olivares, J. Ramírez, P. Glösekötter: „A Study of Vibration-Based Energy Harvesting in Activities of Daily Living“, published at 4th International ICST Conference on Pervasive Computing Technologies for Healthcare, Munich, Germany, March 2010
  • L. O. Keller, K. T. Kallis, R. R. Poloczek and H. L. Fiedler, „Nano-Fin based Mercury-Sensor for environmental surveillance“, In: Journal of Nanoscience and Nanotechnology, Volume 10, Number 9 (2010), S. 5921-5925
  • K. T. Kallis, “Lithographieunabhängige, nanoskalige MOS-Technologie“, Münster: Theophano Verlag 2009, ISBN-Nr. 978-3-9809338-6-5
  • K. T. Kallis, L. O. Keller and H. L. Fiedler, „An advanced LOCOS-Process for the Sub-50 nm-Region using Low-Stress PECVD-Silicon Nitrides“, In: Journal of Nano Research Volume 6 (2009), S. 24-27
  • S. Brabender, K. T. Kallis, L. O. Keller and H. L. Fiedler, „Optimization of reactive ion etching processes using desirability“, Proceedings of the 35th International Conference on Micro and Nanoengineering, MNE’09, Ghent, Belgium 2009,
    Sept. 28 – Oct. 01, S. 1413-1415
  • J. T. Horstmann, K. T. Kallis and H. L. Fiedler, „Experimental Threshold Voltage Fluctuations of 30 nm-NMOS-Transistors Manufactured by a Lithography Independent Structure Definition Process“, Proceedings of the 34th International Conference on Micro- and Nanoengineering (MNE’08), Athen 2008, Sept. 15-18, pp. 1054-1056
  • K. T. Kallis, J. T. Horstmann and H. L. Fiedler, “ Lithography Independent High Accuracy Fabrication and Characterization of Next Generation Nano-MOS-Transistors with L=25 nm and W=75 nm „,Proceedings of the 32nd International Conference on Micro and Nanoengineering ( MNE’06), Barcelona 2007, Sept. 17-20, pp 1484-1487
  • K. Goser, P. Glösekötter, J. Dienstuhl: Nanoelektronik und Nanosysteme: Von Transistoren zu Molekular- und Quantenbauelementen, Chinesische Ausgabe, ISBN 7-5605-2178-9, Verlag: Xi’an Jiaotong University Press, 2006
  • K. T. Kallis, J. T. Horstmann, A. Wiggershaus and H. L. Fiedler, „Manufacturing Considerations of Lithography Independent Nano-MOS-Transistors in the sub-25 nm-region“, Proceedings of the 8th International Conference on Solid-State and Integrated Circuit Technology, Shanghai 2006, October, pp 55-57, IEEE Catalog Number: 06EX1294
  • W. Duengen, R. Job, T. Mueller, Y. Ma and W. R. Fahrner (FU Hagen), L. O. Keller, J. T. Horstmann and H. L. Fiedler (TU Dortmund) , „Blistering of implanted crystalline silicon by plasma hydrogenation investigated by Raman scattering spectroscopy“
    In: Journal of Applied Physics 100 (2006), S.124906
  • W. Duengen, R. Job, T. Mueller, Y. Ma, Y. L. Huang and W. R. Fahrner (FU Hagen), L. O. Keller, J. T. Horstmann and H. L. Fiedler (TU Dortmund) „Thermal Evolution of Hydrogen Related Defects in Hydrogen Implanted Czochralski Silicon Investigated by Raman Spectroscopy and Atmoic Force Microscopy“, In: Journal of Applied Physics 100 (2006), S.034911 (5 Seiten)
  • C. Horst, K. T. Kallis, J. T. Horstmann and H. L. Fiedler
    „CMOS Compatible Fabrication Technique for Nano-Transistors by Conventional Optical Lithography“, In: Journal of Semiconductor Technology and Science, Volume 4, Number 1 (2004)
  • K. Goser, P. Glösekötter, J. Dienstuhl: Nanoelectronics and Nanosystems – From Transistors to Molecular and Quantum Devices, ISBN 3-540-40443-0, 2004, Springer-Verlag Berlin Heidelberg New York
  • P. Glösekötter, W. Prost, C. Pacha, S.O. Kim, H. van Husen, T. Reimann, F.-J. Tegude, K.F. Goser: Circuit and Application Asepects of Tunneling Devices in a MOBILE configuration, Special Issue of the International Journal of Circuit Theory and Applications „Nanoelectronic Circuit“, Appl. 2003; 31:83-103 (invited paper)
  • C. Horst, K. T. Kallis, J. T. Horstmann and K. F. Goser, „Lithography-independent fabrication of nano-MOS-transistors with W = 25 nm and L = 25 nm“, Fifth International Symposium on Instrumentation and Control Technology, Oct. 24 – 27, 2003, Proc. SPIE, Vol. 5253 (2003), pp. 223-227, ISBN 0-8194-5137-1
  • P. Glösekötter, W. Prost, C. Pacha, S.O. Kim, H. van Husen, T. Reimann, F.-J. Tegude, K.F. Goser: Pseudo Dynamic Gate Design based on the Resonant-Tunneling-Bipolar-Transistor (RTBT), published on the 32nd European Solid-State Device Research Conference (ESSDERC), Florence, Italy, Sept. 24-26, 2002
  • J. A. Weima, A. M. Zaitsev, R. Job, G. Kosaca, F. Blum, G. Grabosch, W. R. Fahrner, and J. Knopp „Investigation of non-diamond carbon phases and optical centers in thermochemically polished CVD diamond films“, J. Solid State Electrochem., 4 (8) (2000), p. 425
  • C. Pacha, U. Auer, C. Burwick, P. Glösekötter, A. Brennemann, W. Prost, F.J. Tegude and K.F. Goser: Thresold Logic Circuit Design of Parallel Adders Using Resonant Tunneling Devices, IEEE Transactions on Very Larg Scale Integration (VLSI) Systems, October, 2000, pp. 558-572
  • J. A. Weima, R. Job, W. R. Fahrner, and A. M. Zaitsev, „Low energy carbonaceous and graphite phases on the surfaces of thermochemically polished CVD diamond films“, J. Appl. Phys., 87, (2000), p. 4553
  • C. Pacha, O. Kessler, P. Glösekötter, K.F. Goser, W. Prost, A. Brennemann, U. Auer and F.J. Tegude: Parallel Adder Design with Reduced Circuit Complexity Using Resonant Tunneling Transistors and Threshold Logic, Analog Integrated Circuits and Signal Processing, 24, 7 – 25, 2000, Kluwer Academic Publishers.
  • J. A. Weima, W. R. Fahrner, and R. Job, „Experimental investigation of the parameter dependency of the removal rate of thermochemically polished CVD diamond films“, J. Solid State Electrochem., 5 (2) (2001), p. 112
  • R. Job, J. A. Weima, G. Grabosch, D. Borchert, W. R. Fahrner, V. Raiko, and A. G. Ulyashin, „Rapid low temperature diode fabrication on p-type czochralski silicon on the base of simple hydrogen enhanced thermal donor formation processes“ J. solid state phenomena, 69-70 (1999) p. 551
  • J. A. Weima, R. Job, W. R. Fahrner, and G. C. Kosaca, „Surface Analysis of ultra-precise polished CVD diamond films using spectroscopic and microscopic techniques“, J. Appl. Phys., 89 (2001) p. 2434
  • J. A. Weima, J. von Borany, U. Kreissig, and W. R. Fahrner, „Qualitative analysis of carbon distribution in steel used for thermochemical polishing of diamond films“, Journal of The Electrochemical Society, 148 (11) G607-G610 (2001)
  • J. A. Weima, J. von Borany, R. Grözschel and W. R. Fahrner, „Investigating contaminants on thermochemically refined surfaces of CVD diamond films“ [Accepted for publication by Journal of The Electrochemical Society, NJ, ]
  • J. A. Weima, R. Job and W. R. Fahrner „Thermochemical beveling of CVD diamond films intended for precision cutting and measurement applications“ [Accepted for publication by the Journal of Diamond and Related Materials]
  • J. A. Weima, W. R. Fahrner, J. von Borany and R. Job, „A model of the thermochemical polishing of CVD diamond films on transition metals with emphasis on steel“ [Submitted to Journal of Apply Physics]
  • J. A. Weima, J. von Borany, K. Meusinger, J. Horstmann, W. R. Fahrner, “ Double injection of charge carriers in CVD diamond-based diodes [Submitted for publication to J. Appl. Phys.]
  • J. A. Weima, J. von Borany, K. Meusinger, J. Horstmann, W. R. Fahrner, “ A comparative study of the I-V characteristics of diodes fabricated on as-grown and thermochemically polished CVD diamond films [Submitted for publication to Diamond and Related Materials]
  • J. A. Weima, J. von Borany, K. Meusinger, W. R. Fahrner, „Room temperature electroluminescence of CVD diamond-based diodes [Submitted for publication to Diamond and Related Materials]