{"id":197,"date":"2013-07-01T13:33:52","date_gmt":"2013-07-01T11:33:52","guid":{"rendered":"http:\/\/wihmo.de\/nanotech\/?page_id=197"},"modified":"2019-05-14T13:39:02","modified_gmt":"2019-05-14T11:39:02","slug":"publication","status":"publish","type":"page","link":"https:\/\/nanotech-nrw.de\/?page_id=197","title":{"rendered":"Publikation"},"content":{"rendered":"<ul>\n<li>Likotiko, E.; Petrov, D.; Mwangoka, J.; Hilleringmann, U.: Real time solid waste monitoring using cloud and sensors technologies. In: The Online Journal of Science 2018, 106-116, 2018<\/li>\n<li>Vollbrecht, J.; Oechsle, P.; Stepen, A.; Hoffmann, F; Paradies, J.; Meyers, T.; Hilleringmann, U.; Schmidtke, J; Kitzerow, H.: Liquid crystalline dithienothiophene derivatives for organic electronics, Organic Electronics, Vol. 61, pp. 266-275, 2018,<\/li>\n<li>Meyers, T.; Reker, J.; Vidor, F. F.; Hilleringmann, U.: Deposition methods for C8-BTBT in flexible TFTs. In: Smart Systems Integration 2018, 11.-12. Apr. 2018, Dresden, Germany, pp. 442-445, ISBN 978-3-95735-082-4<\/li>\n<li>Reker, J.; Meyers, T.; Vidor, F. F.; Hilleringmann, U.: Deposition speed optimization for ZnO nanoparticle TFTs using doctor blade process. In: Smart Systems Integration 2018, 11.-12. Apr. 2018, Dresden, Germany, pp. 472-475, ISBN 978-3-95735-082-4<\/li>\n<li>Genei\u00df, T. L\u00fcke, C. Hedayat, M. Wolf, F. Janek, T. Mei\u00dfner, M. Barth, W. Eberhardt, A. Zimmermann, T. Otto: Impedance-Controlled Design and Connection Technology for Micromounting and Hybrid Integration of High-Frequency and Mixed- Signal Systems with MID Technology. In: Smart System Integration &#8211; International Conference and Exhibition on Integration Issues of Miniaturized Systems; 2018; ISBN: 978-3-95735-082-4<\/li>\n<li>Hangmann, C., Hedayat, C., Hilleringmann, U., Otto, T.: Stochastic Analyzes and Monte-Carlo Simulations of nonlinear and non-ideal Mixed-Signal Phase-Locked Loops. In: Smart System Integration &#8211; International Conference and Exhibition on Integration Issues of Miniaturized Systems; 2018; ISBN: 978-3-95735-082-4<\/li>\n<li>Drude, D.; Sch\u00f6nhoff, M.; Hilleringmann, U.; Modular thermoelectric generator for universal waste heat recovery, IDTechEx Europe, Berlin, Germany, 2018 April 11-12<\/li>\n<li>Meyers, T.; Reker, J.; Vidor, F. F.; Schirmer, M.; Mai, T.; Gerngro\u00df, M.; Kaiser, C.; Hilleringmann, U; Characterization of an amorphous perfluorinated copolymer as dielectric for flexible electronics. In: The 44th International Conference on Micro and Nano Engineering (MNE2018), 24.-27. Sep. 2018, Copenhagen, Denmark<\/li>\n<li>Reker, J.; Meyers, T.; Vidor, F. F.; Hilleringmann, U.; Inverter circuits in complementary technology using inorganic nanoparticle-based TFTs. In: 2018 Fall Meeting European Materials Research Society (E-MRS), 17.-20. Sep. 2018, Warsaw, Poland<\/li>\n<li>Meyers, T.; Reker, J.; Temme, J.; Vidor, F. F.; Hilleringmann, U.; Self-aligned organic thin-film transistors for flexible electronics. In: 5th SMEOS Conference, 8.-10. Oct. 2018, Skukuza, South Africa<\/li>\n<li>Meyers, T.; Reker, J..; Vidor, F. F.; Vollbrecht, J.; Kitzerow, H.; Paradies, J. Hilleringmann, U.; Improved organic thin-film transistor performance by dielectric layer patterning. In: 5th SMEOS Conference, 8.-10. Oct. 2018, Skukuza, South Africa<\/li>\n<li>Reker, J.; Meyers, T.; Vidor, F. F.; Hilleringmann, U.; Inorganic p-channel thin-film transistors using CuO nanoparticles. In: 5th SMEOS Conference, 8.-10. Oct. 2018, Skukuza, South Africa<\/li>\n<li>Hilleringmann, U.; Reker, J.; Vidor, F.F.; Meyers, T.; Bezuidenhout, P.H.; Joubert, T.-H.; Nanoparticles and Organic Semiconductors for Flexible Electronics. In: 5th SMEOS Conference, 8.-10. Oct. 2018, Skukuza, South Africa<\/li>\n<li>Vidor, F. F.; Meyers, T.; Reker, J.; M\u00fcller, K.; Wirth, G. I.; Hilleringmann, U.; Mechanical deformation on nanoparticle-based thin-film transistors. In: 5th SMEOS Conference, 8.-10. Oct. 2018, Skukuza, South Africa<\/li>\n<li>Petrov, D.; Meyers, T.; Reker, J.; Hilleringmann, U.; Doctor blade system for the deposition of thin semiconducting films. In: 5th SMEOS Conference, 8.-10. Oct. 2018, Skukuza, South Africa<\/li>\n<li>Schwabe, T.; Balke, A.; Bezuidenhout, P.H.; Reker, J.; Meyers, T.; Joubert, T.-H.; Hilleringmann, U.; Oxygen detection with zinc oxide nanoparticle structures. In: 5th SMEOS Conference, 8.-10. Oct. 2018, Skukuza, South Africa<\/li>\n<li>Meyers, T.; Reker, J.; Petrov, D.; Vidor, F. F.; Hilleringmann, U.; Influence of the electrode material on the performance of BTBT-based thin-film transistors. In: 7. GMM Workshop Mikro-Nano-Integration, 22.-23. Oct. 2018, Dortmund, Germany<\/li>\n<li>Reker, J.; Meyers, T.; Petrov, D.; Vidor, F. F.; Hilleringmann, U.; Performance analysis of CuO nanoparticle-based thin-film transistors. In: 7. GMM Workshop Mikro-Nano-Integration, 22.-23. Oct. 2018, Dortmund, German<\/li>\n<li>Petrov, D.; Narayan, R.S.; Hilleringmann, U.; Portable Sensor System for UV-Irradiation Measurements, Smart Systems Integration 2018 &#8211; International Conference and Exhibition on Integration Issues of Miniaturized Systems, SSI 2018, pp. 468-471, ISBN 978-3-95735-082-<\/li>\n<li>Becker, T. E.; Vidor, F. F.; Wirth, G. I.; Meyers, T.; Reker, J.; Hilleringmann, U.: Time Domain Electrical Characterization in Zinc Oxide Nanoparticle Thin-Film Transistors. In: 2018 IEEE 19th Latin-American Test Symposium (LATS), 12.-14. M\u00e4rz 2018, Sao Paulo, Brazil<\/li>\n<li>Schmidt, M.; Metz, G.; Hedayat, C.; Otto, T.; Petrov, D.; RFID Units for a Product Based Control of Industrial Production Systems, Smart Systems Integration 2018 &#8211; International Conference and Exhibition on Integration Issues of Miniaturized Systems, SSI 2018, pp. 484-487, ISBN 978-3-95735-082-4<\/li>\n<li>Meyers, T.; Vollbrecht, J.; Vidor, F. F.; Reker, J.; Kitzerow, H.-S.; Hilleringmann, U.: Organische D\u00fcnnschichttransistoren f\u00fcr AMOLED-Applikationen. In: 7. MikroSystemTechnik Kongress, 23.-25. Oktober 2017, M\u00fcnchen, Deutschland.<\/li>\n<li>Meyers, T.; Vidor, F.F.; Reker, J.; Hilleringmann, U.; Performance enhancement techniques for flexible electronics, IDTechEx Europe, Berlin, Germany, 2017 May 10-11<\/li>\n<li>Vidor, F. F.; Meyers, T.; Reker, J.; Wirth, G. I.; Hilleringmann, U.: Self-aligned ZnO nanoparticle-based TFTs for flexible electronics. In: 13th IEEE Africon 2017, 18.-20. September 2017, Kapstadt, S\u00fcdafrika.<\/li>\n<li>Sch\u00f6nhoff, M.; Hilleringmann, U.; De Boor, J.: Mass Production of Magnesium Silicide as a TEG Material, IEEE Africon 2017 Proceedings, S. 1009-1013.<\/li>\n<li>Reker, J.; Meyers, T.; Vidor, F. F.; Hilleringmann, U.: Deposition of ZnO nanoparticles for thin-film transistors by doctor blade process. In: 13th IEEE Africon 2017, 18.-20. September 2017, Kapstadt, S\u00fcdafrika.<\/li>\n<li>Reker, J.; Meyers, T.; Vidor, F. F.; Hilleringmann, U.: Integrationstechnik f\u00fcr ZnO-Nanopartikel-D\u00fcnnschichttransistoren. In: 7. MikroSystemTechnik Kongress, 23.-25. Oktober 2017, M\u00fcnchen, Deutschland.<\/li>\n<li>Meyers, T.; Vollbrecht, J.; Vidor, F. F.; Reker, J.; Kitzerow, H.-S.; Hilleringmann, U.: Organic Thin-Film Transistors for AMOLED Applications. In: 7. MikroSystemTechnik Kongress, 23.-25. Oktober 2017, M\u00fcnchen, Deutschland.<\/li>\n<li>Likotiko, E.; Petrov, D.; Mwangoka, J.; Hilleringmann, U.: REAL TIME SOLID WASTE MONITORING USING CLOUD AND SENSORS TECHNOLOGIES, Proceedings International Science and Technology Conference, ISSN:2146-7382, 2017, S. 441-450<\/li>\n<li>Hilleringmann, U.: Halbleitende Nanopartikel f\u00fcr Feldeffekttransistoren, in: Nanotechnologie und Nanoprozesse, 2. Auflage, Springer-Verlag, Hrsg. W. R. Fahrner, 2017, S. 290 \u2013 296<\/li>\n<li>Hilleringmann, U.: \u00c4tzung von Nanostrukturen, in: Nanotechnologie und Nanoprozesse, 2. Auflage, Springer-Verlag, Hrsg. W. R. Fahrner, 2017, S. 174 \u2013 197<\/li>\n<li>Hett, T.; Kr\u00e4mmer, S.; Hilleringmann, U.; Kalt, H.; Zrenner, A.; High-Q whispering gallery microdisk resonators based on silicon oxynitride, Journal of Luminescence, vol. 191, pp. 131-134, ISSN 0022-2313.<\/li>\n<li>Hangmann,C.; Hedayat,C.; L\u00fcke,T.; Hilleringmann, U.: Improved RF Design Using a Combination of Precise 3D Near-Field Measurements and CST Simulations, CST European User Conference, 2017.<\/li>\n<li>Hilleringmann, U.; Horstmann, J.T.; Job, R.: Erweiterung konventioneller Bauelemente durch Nanotechniken, in: Nanotechnologie und Nanoprozesse, 2. Auflage, Springer-Verlag, Hrsg. W. R. Fahrner, 2017, S. 245 &#8211; 258<\/li>\n<li>Sch\u00f6nhoff, M.; Hilleringmann, U.; TEGs as self-sufficient power supply for sensors and microelectromechanical systems, SPIE Digital Library as part of the proceedings of the Fourth Conference on Sensors, doi: 10.1117\/12.2243133<\/li>\n<li>Hilleringmann, U.; Vidor F. F.; Meyers T.; Complementary field-effect transistors for flexible electronics, Proc. SPIE 10036, Fourth Conference on Sensors, MEMS, and Electro-Optic Systems, 100360K, 2017<\/li>\n<li>Meyers, T.; Vidor, F.F.; Brassat, K.; Lindner, J.K.N; Hilleringmann, U.; Low-voltage DNTT based thin-film transistors and inverters for flexible electronics, Microelectronic Engineering, Vol. 174, pp. 35-39, 2017<\/li>\n<li>Vidor, F.F.; Meyers, T.; Hilleringmann, U.; Integration of ZnO nanoparticle transistor on freestanding flexible substrates, Proc. SPIE 10036, Fourth Conference on Sensors, MEMS, and Electro-Optic Systems, 100360A, 2017<\/li>\n<li>Meyers, T.; Vidor, F. F.; Reker, J.; Brockschmidt, T.; Wirth, G. I.; Hilleringmann, U; Electric field-assisted performance improvement of solution-processed organic thin-film transistors. In: The 43th International Conference on Micro and Nano Engineering (MNE2017), 18.-22. 2017, Braga, Portugal<\/li>\n<li><b>K. T. Kallis, V. V. Vendt, C. K\u00fcchenmeister, H. L. Fiedler<\/b><br \/>\n\u201ePreparation of nanoscale thermal time of flight sensors by e-beam lithography\u201d,<br \/>\nIn: Microelectronic Engineering, Volume 97 (Sept. 2012,) S. 357-360<\/li>\n<li><b>C. M. Zimmer, M. Kieschnick, K. T. Kallis, J. Schubert, U. Kunze and T.Doll <\/b>\u201eNano photoelectron ioniser chip using LaB6 for ambient pressure trace gas detection\u201d, In: Microelectronic Engineering, Volume 98 (Oct. 2012), S. 472-476<\/li>\n<li>U. K\u00fcnzelmann, M. R. M\u00fcller, K. T. Kallis, F. Sch\u00fctte, S. Menzel, S. Engels, J. Fong, C. Lin, J. Dysard, J.W. Bartha and J. Knoch<br \/>\n&#8222;Chemical-Mechanical Planarization of Aluminium Damascene Structures&#8220;,<br \/>\nInt. Conference on Planarization\/CMP Technology (ICPT 2012), Proceedings, pp. 371-376<\/li>\n<li>F. Hoffmann, A. Loechte, G. Rebel, C. Krimphove, P. Gl\u00f6sek\u00f6tter:<br \/>\n<b>Degr<\/b>adation aware energy storage using hybrid capacitors, published at 2nd IEEE<br \/>\nENERGYCON Conference &amp; Exhibition, 2012, pp 60, ISBN 978-1-4673-1452-7,<br \/>\nSeptember 9-12 2012, Florence, Italy<\/li>\n<li>C. Krimphove, F. Hoffmann, G. Rebel, P. Gl\u00f6sek\u00f6tter:<br \/>\n<b>Wearout-Free Oxygen Sensor<\/b>, published and awarded with the Bronze Leaf Certificate at the 8th Conference on Ph.D. Research in Microelectronics &amp; Electronics, pp 339, ISBN 978-3-8007-3442-9, 12 &#8211; 15 Juni 2012, Aachen, Germany<\/li>\n<li><b>K. T. Kallis, J. T. Horstmann and H. L. Fiedler, <\/b>&#8222;Parameter fluctuations in multiple patterned deca-nm scaled CMOS structures&#8220;, In: Journal of Nano Research , Vol. 17 (Feb.2012), S. 157-163<\/li>\n<li>C. Kontis, C. K\u00fcchenmeister, M. M\u00fcller, K. Kallis and J. Knoch, &#8222;Optimizing the identification of mono- and bilayer graphene on multilayer substrates&#8220;, In: Applied Optics, Vol. 51, Issue 3 (Jan. 2012), S. 385-389<\/li>\n<li>K. T. Kallis, J. T. Horstmann, C. K\u00fcchenmeister, L. O. Keller and H. L. Fiedler<br \/>\n&#8222;Enhanced lithography independent MOSFET-fabrication on bulk silicon with sub-50 nm-dimensions&#8220;, Transactions on Systems, Signals &amp; Devices, Issues on Sensors, Circuits &amp; Instrumentation Systems, Vol. 5, No. 4 (Dec. 2011)<\/li>\n<li>K. T. Kallis, L. O. Keller, C. K\u00fcchenmeister, J. T. Horstmann, J. Knoch and H. L. Fiedler, &#8222;Nanofin based filaments for sensor applications&#8220;, Proceedings of the 36th International Conference on Micro- and Nano-Engineering (MNE), In: Microelectronic Engineering, Volume 88, Issue 8 (August 2011), Pages 2290-2293<\/li>\n<li>J. T. Horstmann, K. T. Kallis and H. L. Fiedler<br \/>\n&#8222;Reliability and Electrical Parameter Fluctuations of sub-50nm MOS-Transistors&#8220;<br \/>\nIn: Micromaterials and Nanomaterials 12 (2010), pp. 32-38, ISSN 1619-2486<\/li>\n<li><b>R. R. Poloczek, K. T. Kallis, L. O. Keller and H. L. Fiedler<\/b><br \/>\n\u201eA new cost-effective Method of Planarisation for Multiple Metal Layers in the Sub-100 nm-Region\u201c In: Journal of Nanoscience and Nanotechnology, Volume 10, Number 9 (2010), S. 6046-6048<\/li>\n<li>A. Olivares, J.M. G\u00f3rriz, G. Olivares, J. Ram\u00edrez, P. Gl\u00f6sek\u00f6tter: &#8222;A Study of Vibration-Based Energy Harvesting in Activities of Daily Living&#8220;, published at 4th International ICST Conference on Pervasive Computing Technologies for Healthcare, Munich, Germany, March 2010<\/li>\n<li><b>L. O. Keller, K. T. Kallis, R. R. Poloczek and H. L. Fiedler, <\/b>\u201eNano-Fin based Mercury-Sensor for environmental surveillance\u201c, In: Journal of Nanoscience and Nanotechnology, Volume 10, Number 9 (2010), S. 5921-5925<\/li>\n<li>K. T. Kallis, \u201cLithographieunabh\u00e4ngige, nanoskalige MOS-Technologie\u201c, M\u00fcnster: Theophano Verlag 2009, ISBN-Nr. 978-3-9809338-6-5<\/li>\n<li>K. T. Kallis, L. O. Keller and H. L. Fiedler, \u201eAn advanced LOCOS-Process for the Sub-50 nm-Region using Low-Stress PECVD-Silicon Nitrides\u201c, In: Journal of Nano Research Volume 6 (2009), S. 24-27<\/li>\n<li><b>S. Brabender, K. T. Kallis, L. O. Keller and H. L. Fiedler<\/b>, \u201eOptimization of reactive ion etching processes using desirability\u201c, Proceedings of the 35th International Conference on Micro and Nanoengineering, MNE\u201909, Ghent, Belgium 2009,<br \/>\nSept. 28 &#8211; Oct. 01, S. 1413-1415<\/li>\n<li><b>J. T. Horstmann, K. T. Kallis and H. L. Fiedler, <\/b>&#8222;Experimental Threshold Voltage Fluctuations of 30 nm-NMOS-Transistors Manufactured by a Lithography Independent Structure Definition Process\u201c, Proceedings of the 34th International Conference on Micro- and Nanoengineering (MNE\u201908), Athen 2008, Sept. 15-18, pp. 1054-1056<\/li>\n<li><b>K. T. Kallis, J. T. Horstmann and H. L. Fiedler, <\/b>&#8220; Lithography Independent High Accuracy Fabrication and Characterization of Next Generation Nano-MOS-Transistors with L=25 nm and W=75 nm &#8222;,Proceedings of the 32nd International Conference on Micro and Nanoengineering ( MNE\u201906), Barcelona 2007, Sept. 17-20, pp 1484-1487<\/li>\n<li>K. Goser, P. Gl\u00f6sek\u00f6tter, J. Dienstuhl: Nanoelektronik und Nanosysteme: Von Transistoren zu Molekular- und Quantenbauelementen, Chinesische Ausgabe, ISBN 7-5605-2178-9, Verlag: Xi&#8217;an Jiaotong University Press, 2006<\/li>\n<li><b>K. T. Kallis, J. T. Horstmann, A. Wiggershaus and H. L. Fiedler<\/b>, &#8222;Manufacturing Considerations of Lithography Independent Nano-MOS-Transistors in the sub-25 nm-region&#8220;, Proceedings of the 8th International Conference on Solid-State and Integrated Circuit Technology, Shanghai 2006, October, pp 55-57<i>, <\/i>IEEE Catalog Number: 06EX1294<\/li>\n<li><b>W. Duengen, R. Job, T. Mueller, Y. Ma and W. R. Fahrner (FU Hagen)<b>,<b> <\/b><\/b>L. O. Keller, J. T. Horstmann and H. L. Fiedler (TU Dortmund) <b>, <\/b><\/b>&#8222;Blistering of implanted crystalline silicon by plasma hydrogenation investigated by Raman scattering spectroscopy&#8220;<br \/>\nIn: Journal of Applied Physics 100 (2006), S.124906<\/li>\n<li><b>W. Duengen, R. Job, T. Mueller, Y. Ma, Y. L. Huang and W. R. Fahrner (FU Hagen), L. O. Keller, J. T. Horstmann and H. L. Fiedler (TU Dortmund) <\/b>&#8222;Thermal Evolution of Hydrogen Related Defects in Hydrogen Implanted Czochralski Silicon Investigated by Raman Spectroscopy and Atmoic Force Microscopy&#8220;, In: Journal of Applied Physics 100 (2006), S.034911 (5 Seiten)<\/li>\n<li>C. Horst, K. T. Kallis, J. T. Horstmann and H. L. Fiedler<br \/>\n&#8222;CMOS Compatible Fabrication Technique for Nano-Transistors by Conventional Optical Lithography&#8220;, In: Journal of Semiconductor Technology and Science, Volume 4, Number 1 (2004)<\/li>\n<li>K. Goser, P. Gl\u00f6sek\u00f6tter, J. Dienstuhl: Nanoelectronics and Nanosystems &#8211; From Transistors to Molecular and Quantum Devices, ISBN 3-540-40443-0, 2004, Springer-Verlag Berlin Heidelberg New York<\/li>\n<li>P. Gl\u00f6sek\u00f6tter, W. Prost, C. Pacha, S.O. Kim, H. van Husen, T. Reimann, F.-J. Tegude, K.F. Goser: Circuit and Application Asepects of Tunneling Devices in a MOBILE configuration, Special Issue of the International Journal of Circuit Theory and Applications &#8222;Nanoelectronic Circuit&#8220;, Appl. 2003; 31:83-103 (invited paper)<\/li>\n<li>C. Horst, K. T. Kallis, J. T. Horstmann and K. F. Goser, &#8222;Lithography-independent fabrication of nano-MOS-transistors with W = 25 nm and L = 25 nm&#8220;, Fifth International Symposium on Instrumentation and Control Technology, Oct. 24 &#8211; 27, 2003, Proc. SPIE, Vol. 5253 (2003), pp. 223-227, ISBN 0-8194-5137-1<\/li>\n<li>P. Gl\u00f6sek\u00f6tter, W. Prost, C. Pacha, S.O. Kim, H. van Husen, T. Reimann, F.-J. Tegude, K.F. Goser: Pseudo Dynamic Gate Design based on the Resonant-Tunneling-Bipolar-Transistor (RTBT), published on the 32nd European Solid-State Device Research Conference (ESSDERC), Florence, Italy, Sept. 24-26, 2002<\/li>\n<li>J. A. Weima, A. M. Zaitsev, R. Job, G. Kosaca, F. Blum, G. Grabosch, W. R. Fahrner, and J. Knopp &#8222;Investigation of non-diamond carbon phases and optical centers in thermochemically polished CVD diamond films&#8220;, J. Solid State Electrochem., 4 (8) (2000), p. 425<\/li>\n<li>C. Pacha, U. Auer, C. Burwick, P. Gl\u00f6sek\u00f6tter, A. Brennemann, W. Prost, F.J. Tegude and K.F. Goser: Thresold Logic Circuit Design of Parallel Adders Using Resonant Tunneling Devices, IEEE Transactions on Very Larg Scale Integration (VLSI) Systems, October, 2000, pp. 558-572<\/li>\n<li>J. A. Weima, R. Job, W. R. Fahrner, and A. M. Zaitsev, &#8222;Low energy carbonaceous and graphite phases on the surfaces of thermochemically polished CVD diamond films&#8220;, J. Appl. Phys., 87, (2000), p. 4553<\/li>\n<li>C. Pacha, O. Kessler, P. Gl\u00f6sek\u00f6tter, K.F. Goser, W. Prost, A. Brennemann, U. Auer and F.J. Tegude: Parallel Adder Design with Reduced Circuit Complexity Using Resonant Tunneling Transistors and Threshold Logic, Analog Integrated Circuits and Signal Processing, 24, 7 &#8211; 25, 2000, Kluwer Academic Publishers.<\/li>\n<li>J. A. Weima, W. R. Fahrner, and R. Job, &#8222;Experimental investigation of the parameter dependency of the removal rate of thermochemically polished CVD diamond films&#8220;, J. Solid State Electrochem., 5 (2) (2001), p. 112<\/li>\n<li>R. Job, J. A. Weima, G. Grabosch, D. Borchert, W. R. Fahrner, V. Raiko, and A. G. Ulyashin, &#8222;Rapid low temperature diode fabrication on p-type czochralski silicon on the base of simple hydrogen enhanced thermal donor formation processes&#8220; J. solid state phenomena, 69-70 (1999) p. 551<\/li>\n<li>J. A. Weima, R. Job, W. R. Fahrner, and G. C. Kosaca, &#8222;Surface Analysis of ultra-precise polished CVD diamond films using spectroscopic and microscopic techniques&#8220;, J. Appl. Phys., 89 (2001) p. 2434<\/li>\n<li>J. A. Weima, J. von Borany, U. Kreissig, and W. R. Fahrner, &#8222;Qualitative analysis of carbon distribution in steel used for thermochemical polishing of diamond films&#8220;, Journal of The Electrochemical Society, 148 (11) G607-G610 (2001)<\/li>\n<li>J. A. Weima, J. von Borany, R. Gr\u00f6zschel and W. R. Fahrner, &#8222;Investigating contaminants on thermochemically refined surfaces of CVD diamond films&#8220; [Accepted for publication by Journal of The Electrochemical Society, NJ, ]<\/li>\n<li>J. A. Weima, R. Job and W. R. Fahrner &#8222;Thermochemical beveling of CVD diamond films intended for precision cutting and measurement applications&#8220; [Accepted for publication by the Journal of Diamond and Related Materials]<\/li>\n<li>J. A. Weima, W. R. Fahrner, J. von Borany and R. Job, &#8222;A model of the thermochemical polishing of CVD diamond films on transition metals with emphasis on steel&#8220; [Submitted to Journal of Apply Physics]<\/li>\n<li>J. A. Weima, J. von Borany, K. Meusinger, J. Horstmann, W. R. Fahrner, &#8220; Double injection of charge carriers in CVD diamond-based diodes [Submitted for publication to J. Appl. Phys.]<\/li>\n<li>J. A. Weima, J. von Borany, K. Meusinger, J. Horstmann, W. R. Fahrner, &#8220; A comparative study of the I-V characteristics of diodes fabricated on as-grown and thermochemically polished CVD diamond films [Submitted for publication to Diamond and Related Materials]<\/li>\n<li>J. A. Weima, J. von Borany, K. Meusinger, W. R. Fahrner, &#8222;Room temperature electroluminescence of CVD diamond-based diodes [Submitted for publication to Diamond and Related Materials]<\/li>\n<\/ul>\n","protected":false},"excerpt":{"rendered":"<p>Likotiko, E.; Petrov, D.; Mwangoka, J.; Hilleringmann, U.: Real time solid waste monitoring using cloud and sensors technologies. In: The Online Journal of Science 2018, 106-116, 2018 Vollbrecht, J.; Oechsle, P.; Stepen, A.; Hoffmann, F; Paradies, J.; Meyers, T.; Hilleringmann, &hellip; <a href=\"https:\/\/nanotech-nrw.de\/?page_id=197\">Weiterlesen <span class=\"meta-nav\">&rarr;<\/span><\/a><\/p>\n","protected":false},"author":3,"featured_media":0,"parent":0,"menu_order":0,"comment_status":"closed","ping_status":"closed","template":"","meta":{"footnotes":""},"class_list":["post-197","page","type-page","status-publish","hentry"],"_links":{"self":[{"href":"https:\/\/nanotech-nrw.de\/index.php?rest_route=\/wp\/v2\/pages\/197","targetHints":{"allow":["GET"]}}],"collection":[{"href":"https:\/\/nanotech-nrw.de\/index.php?rest_route=\/wp\/v2\/pages"}],"about":[{"href":"https:\/\/nanotech-nrw.de\/index.php?rest_route=\/wp\/v2\/types\/page"}],"author":[{"embeddable":true,"href":"https:\/\/nanotech-nrw.de\/index.php?rest_route=\/wp\/v2\/users\/3"}],"replies":[{"embeddable":true,"href":"https:\/\/nanotech-nrw.de\/index.php?rest_route=%2Fwp%2Fv2%2Fcomments&post=197"}],"version-history":[{"count":13,"href":"https:\/\/nanotech-nrw.de\/index.php?rest_route=\/wp\/v2\/pages\/197\/revisions"}],"predecessor-version":[{"id":472,"href":"https:\/\/nanotech-nrw.de\/index.php?rest_route=\/wp\/v2\/pages\/197\/revisions\/472"}],"wp:attachment":[{"href":"https:\/\/nanotech-nrw.de\/index.php?rest_route=%2Fwp%2Fv2%2Fmedia&parent=197"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}